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RESIST STRIPPER
CENTURION Metal-Etch 50
CENTOX OXIDISER
PUMPS & DENSITY CONTROLLERS
MEC 5 SERIES MICROETCHES
MECetchBONDCZ-8100/CZ-2001
FLUX 2300 SERIES
OSP MECSEAL RANGE
OXFORD VUE CUPRIC CHLORIDE CONTROLLER
INSPECTION EQUIPMENT
OXFORD FERRIC CHLORIDE CONTROLLER
SOLDERMASK STRIPPER
V BOND
VISPER Inspection Equipment
AMALPHA
FLAT BOND

OXFORD VUE CUPRIC CHLORIDE CONTROLLER

Almost  zero acid provides maximum fine line etching capabilities. Over 200 installations provides testament to the ease of use of this system.

  •  Uses patented light transmission method which does not require frequent recalibration as some other machines that use O.R.P. Normality and specific gravity.
  • High sensitivity Glass Light Cells monitor changes in continuosly
  • High copper content means more valuable spent etchant, less waste generated.
  • Higher etch factor than other cupric controllers due to zero free acid in etchant.
  • Zero free acid in etchant eliminates attacks on dry film and titanium etcher parts.
  • Tight control of etchant means no chlorine gas is released during etching process.
  • Minimizes down time with modular electronics and chemical section components.
  • Self-monitoring for flow errors, chemical input leaks and meter errors virtually eliminate lost production.
  • Ground fault circuit interrupt protected for maximum safety.
  • No costly pumps are used. Uses pressure from your etcher to drive the injection of chemicals.

Click Here for OxfordVUE presentation

Click Here for technical data involved in the etching process